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Strain Engineered MOSFETs
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About The Book:
This book centers around late advancements in designed MOSFETS that are actualized in high-versatility substrates, for example, Ge, SiGe, stressed Si and German-Germanium stages over the reduced cushion, notwithstanding high-k condensers and metal door. It covers parts of materials, standards, propelled equipment plan, manufacture, and applications. It likewise presents the TCAD structure system for complete Si-CMOS PC helped plan for pressure designing, which incorporates information stream from process reproductions to a recreation of procedure fluctuation by reenacting the gadget and making worked in SPICE procedures to improve efficiency.
Contents Of The Book:
Chapter 1. Introduction.
Chapter 2. Substrate-Induced Strain Engineering in CMOS Technology.
Chapter 3. Process-Induced Stress Engineering in CMOS Technology.
Chapter 4. Electronic Properties of Strain-Engineered Semiconductors.
Chapter 5. Strain-Engineered MOSFETs.
Chapter 6. Noise in Strain-Engineered Devices.
Chapter 7. Technology CAD of Strain-Engineered MOSFETs.
Chapter 8. Reliability and Degradation of Strain-Engineered MOSFETs.
Chapter 9. Process Compact Modelling of Strain-Engineered MOSFETs.
Chapter 10. Process-Aware Design of Strain-Engineered MOSFETs.
Chapter 11. Conclusions.
Information About The Book:
Title: Strain Engineered MOSFETs.
Language: English.
Size: 13.2 Mb.
Pages: 311.
Format: PDF
Year: 2012.
Edition: 1.
Author: C K Maiti and T K Maiti.